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Arnaud Régnier
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2020 – today
- 2023
- [c13]Lucas Antunes Tambara, Pascal Masson, Julien Amouroux, Stéphane Monfray, Julien Dura, Frederic Gianesello, Julien Babic, Romain Debroucke, Loic Welter, Siddhartha Dhar, Bernadette Gros, Clement Charbuillet, Franck Julien, Guillaume Bertrand, Arnaud Régnier, Alain Fleury:
Notched gate MOSFET for capacitance reduction in RF SOI technology. DTTIS 2023: 1-4 - [c12]Radouane Habhab, Vincenzo Della Marca, Pascal Masson, Nadia Miridi, Clement Pribat, Simon Jeannot, Thibault Kempf, Marc Mantelli, Philippe Lorenzini, Jean-Marc Voisin, Arnaud Régnier, Stephan Niel, Francesco La Rosa:
40nm SONOS Embedded Select in Trench Memory. ESSDERC 2023: 21-24 - 2022
- [c11]Paul Devoge, Hassen Aziza, Philippe Lorenzini, Pascal Masson, Alexandre Malherbe, Franck Julien, Abderrezak Marzaki, Arnaud Régnier, Stephan Niel:
A Schmitt trigger to benchmark the performance of a new zero-cost transistor. ICECS 2022 2022: 1-4 - [c10]Paul Devoge, Hassen Aziza, Philippe Lorenzini, Alexandre Malherbe, Franck Julien, Abderrezak Marzaki, Arnaud Régnier, Stephan Niel:
Digital-to-analog converters to benchmark the matching performance of a new zero-cost transistor. ISCAS 2022: 761-764 - 2021
- [c9]Paul Devoge, Hassen Aziza, Philippe Lorenzini, Franck Julien, Abderrezak Marzaki, Alexandre Malherbe, Marc Mantelli, Thomas Sardin, Sébastien Haendler, Arnaud Régnier, Stephan Niel:
Circuit-level evaluation of a new zero-cost transistor in an embedded non-volatile memory CMOS technology. DTIS 2021: 1-5 - [c8]Romeric Gay, Vincenzo Della Marca, Hassen Aziza, Arnaud Régnier, Stephan Niel, Abderrezak Marzaki:
Benchmarking and optimization of trench-based multi-gate transistors in a 40 nm non-volatile memory technology. DTIS 2021: 1-4 - [c7]Franck Matteo, Roberto Simola, Franck Melul, Karine Coulié, Jérémy Postel-Pellerin, Arnaud Régnier:
Simulation of state of the art EEPROM programming window closure during endurance degradation. DTIS 2021: 1-5 - [c6]Franck Melul, Thibault Kempf, Vincenzo Della Marca, Marc Bocquet, Madjid Akbal, Frederique Trenteseaux, Marc Mantelli, Arnaud Régnier, Stephan Niel, Francesco La Rosa:
Hot Electron Source Side Injection Comprehension in 40nm eSTM™. IMW 2021: 1-4 - 2020
- [c5]Jordan Locati, Vincenzo Della Marca, Christian Rivero, Arnaud Régnier, Stephan Niel, Karine Coulié:
AC stress reliability study of a new high voltage transistor for logic memory circuits. IRPS 2020: 1-5
2010 – 2019
- 2018
- [j5]Vincenzo Della Marca, Jérémy Postel-Pellerin, Thibault Kempf, Arnaud Régnier, Philippe Chiquet, Marc Bocquet:
Quantitative correlation between Flash and equivalent transistor for endurance electrical parameters extraction. Microelectron. Reliab. 88-90: 159-163 (2018) - [c4]Thibault Kempf, Vincenzo Della Marca, L. Baron, F. Maugain, Francesco La Rosa, Stephan Niel, Arnaud Régnier, Jean-Michel Portal, Pascal Masson:
Threshold voltage bitmap analysis methodology: Application to a 512kB 40nm Flash memory test chip. IRPS 2018: 6 - 2015
- [c3]Jordan Innocenti, Franck Julien, Jean-Michel Portal, Laurent Lopez, Q. Hubert, Pascal Masson, Jacques Sonzogni, Stephan Niel, Arnaud Régnier:
Layout optimizations to decrease internal power and area in digital CMOS standard cells. MIPRO 2015: 1582-1587 - 2014
- [c2]Jordan Innocenti, Loic Welter, Franck Julien, Laurent Lopez, Jacques Sonzogni, Stephan Niel, Arnaud Régnier, Emmanuel Paire, Karen Labory, Eric Denis, Jean-Michel Portal, Pascal Masson:
Dynamic power reduction through process and design optimizations on CMOS 80 nm embedded non-volatile memories technology. MWSCAS 2014: 897-900 - 2012
- [j4]Guillaume Just, Vincenzo Della Marca, Arnaud Régnier, Jean-Luc Ogier, Jérémy Postel-Pellerin, Jean-Michel Portal, Pascal Masson:
Effects of Lightly Doped Drain and Channel Doping Variations on Flash Memory Performances and Reliability. J. Low Power Electron. 8(5): 717-724 (2012) - [j3]R. Llido, Pascal Masson, Arnaud Régnier, Vincent Goubier, Gérald Haller, Vincent Pouget, Dean Lewis:
Effects of 1064 nm laser on MOS capacitor. Microelectron. Reliab. 52(9-10): 1816-1821 (2012) - 2010
- [j2]Jérémy Postel-Pellerin, Romain Laffont, Gilles Micolau, Frédéric Lalande, Arnaud Régnier, Bernard Bouteille:
Leakage paths identification in NVM using biased data retention. Microelectron. Reliab. 50(9-11): 1474-1478 (2010)
2000 – 2009
- 2008
- [j1]D. Pic, Arnaud Régnier, V. Pean, Jean-Luc Ogier, Didier Goguenheim:
Dynamic stress method for accurate NVM oxide robustness evaluation for automotive applications. Microelectron. Reliab. 48(8-9): 1318-1321 (2008) - 2006
- [c1]B. Saillet, Arnaud Régnier, Jean-Michel Portal, B. Delsuc, Romain Laffont, Pascal Masson, Rachid Bouchakour:
MM11 based flash memory cell model including characterization procedure. ISCAS 2006
Coauthor Index
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