| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eaaae6a566fff2d9afed9da8d52f4939
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_96f14883ce3dc76a50c579083a554ee6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2301-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2203-13 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F9-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B34-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-0525 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B34-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F9-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B5-04 |
| filingDate |
2005-04-09^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c61bf1a47757fa41faebdc6af080884
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e03991bf081ea80043ef6d9d73af6ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e525ab64a9f389833d5f2e8368cc599
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_311c7060a7f40f7530e4c5b63151ea7b |
| publicationDate |
2007-10-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
BR-PI0510157-A |
| titleOfInvention |
process for the manufacture of niobium and tantalum powder |
| abstract |
PROCESS FOR THE MANUFACTURE OF NIOBIO DUST AND DENTAL POWDER. Process for the manufacture of valve metal powders, especially niobium and tantalum powders by reducing the corresponding valve metal oxide powders by means of steam-reducing metals and / or their hydrides, preferably in the presence of an inert carrier gas, the reduction being effected with a partial vapor pressure of the metal / reducing metal hydride of 5 to 110 hPa and a total pressure of less than 1000 hPa and the tantalum powder thus obtained with a high stability of particle board powder. |
| priorityDate |
2004-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |