http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-2421206-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ddadb999be4f451dfc44d8e359d8f6a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-63 |
| filingDate | 2001-09-18^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_656c0b5202442bc238f80cc5afc4989f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47da9bc514fceac0d8580fe3c860d169 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad121e2dc3047f6d5102e3c4b452b71d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72a5bd935c77ba5cce4353e9de95c5cc |
| publicationDate | 2002-03-28^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-2421206-A1 |
| titleOfInvention | Oxime derivatives and the use thereof as latent acids |
| abstract | New oxime sulfonate compounds of formula (I, II, III, IV, V, VI and VII) wherein R1 is for example C1-C18 alkylsulfonyl, R2 is halogen or C1-C10 haloalkyl; R3 is for example unsubstituted or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12 alkylene; -O-C-bond or a O-Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, -O-, or S-, or are C1-C12 alkylene or phenylene unsubstituted or substituted; Y1 is C1-C12 alkylene which is for example subsituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12 alkylene; Y3 is e.g. a tetravalent radical of C1-C12 alkylene; X is halogen; Ar'1 is for example C1-C12 alkyl which is unsubstituted or substituted; Ar"1 is for example phenylene; provided that at least one of the radicals Ar'1, Ar"1, is substituted by 1 to 3 groups of (VIII), (IX), (X), (XI), (XII) and/or (XIII); M+ is e.g. (XIV); L- is for example halogen; R15, R16, R17 and R18 are e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists. |
| priorityDate | 2000-09-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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