| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
2006-07-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1728e5073057407cc1016b2e766ae973
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_badacf4b9948e34a32f2edc4eda84ea8 |
| publicationDate |
2008-08-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101253449-A |
| titleOfInvention |
Photosensitive resin composition and photosensitive element |
| abstract |
A photosensitive resin composition comprising compound (a) obtained by reacting a polybasic acid anhydride with phenolic hydroxyl of a novolac phenolic resin and 1,2-quinonediazide compound (b). A photosensitive resin composition satisfactorily excelling in photosensitivity, image contrast, resolution and adherence can be obtained by addition of the component of 1,2-quinonediazide compound (b) to the component (a) obtained by reacting a polybasic acid anhydride with phenolic hydroxyl of a novolac phenolic resin. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104871088-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106597813-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106597813-B |
| priorityDate |
2005-08-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |