| abstract |
The invention provides a salt and a photoresist composition containing the same. The salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents *-CO-O-La- or *-CH2-O-Lb-, * represents a binding position to -C (Q1) (Q2)-, La and Lb independently represent a C1-C15 divalent saturated hydrocarbon group in which one or more -CH2- can be replaced by -O- or -CO-, ring W1 represents a C2-C36 nitrogen-containing heterocyclic group in which one or more -CH2- can be replaced by -O-, and Z1+ represents an organic counter ion. |