http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102760632-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2012-04-25^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-07-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-07-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102760632-B |
| titleOfInvention | Plasma processing apparatus |
| abstract | The invention provides a kind of plasma treatment appts, it possesses: container handling; Workbench; Dielectric members; Import the unit of microwave; Injector; With electric field shielding portion.Container handling divides formation processing space therein.Workbench is arranged in container handling.Dielectric members is in the face of workbench setting.Microwave imports in process space via dielectric members by the unit importing microwave.Injector is dielectric system, has more than one through hole.Injector is such as made up of loose dielectric substance.This injector is configured in the inside of dielectric members.Injector is formed for supplying to processing space the path processing gas with being formed in divide together with the through hole on dielectric members.Electric field shielding portion covers around injector. |
| priorityDate | 2011-04-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261 |
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