| abstract |
Problem of the present invention is the high refractive index film with the transparency used in the resist lower membrane with thermotolerance of the photo-mask process of the manufacture being provided for semiconducter device and electronic component.The invention provides a kind of polymkeric substance, it contains the structural unit shown in following formula (1),n in formula (1) formula (1), Rn 1 , Rn 2 , Rn 3 and Rn 5 represent hydrogen atom respectively, Rn 4 represent phenyl or naphthyl.The composition of the formation resist lower membrane containing above-mentioned polymkeric substance is also provided, and the resist lower membrane formed by it.The high refractive index film composition of the formation high refractive index film containing above-mentioned polymkeric substance being also provided and being formed by it. |