| abstract |
The present invention includes an exposure chamber configured to contain a passivating gas having a selected concentration of hydrogen, the exposure chamber further configured to contain at least one NLO crystal for exposure to the passivating gas within the chamber; a passivation gas source fluidly connected to the exposure chamber, the passivation gas source configured to supply passivation gas to an interior portion of the exposure chamber; and a substrate configured to apply the NLO crystal Holden within the chamber, the substrate is further configured to maintain a temperature of the NLO crystal at or near a selected temperature that is below a melting temperature of the NLO crystal. |