http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104209853-B

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filingDate 2014-05-30^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-01-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-01-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104209853-B
titleOfInvention Soft and conditionable chemical mechanical window polishing pad
abstract A chemical mechanical polishing pad is provided containing: a polishing layer; a plug in place endpoint detection window block; a rigid layer; and, a hot melt adhesive bonding the polishing layer to the rigid layer; wherein the polishing layer comprises the reaction product of ingredients, including: a polyfunctional isocyanate; and, a curative package; wherein the curative package contains an amine initiated polyol curative and a high molecular weight polyol curative; wherein the polishing layer exhibits a density of greater than 0.6 g/cm3; a Shore D hardness of 5 to 40; an elongation to break of 100 to 450%; and, a cut rate of 25 to 150 [mu]m/hr; and, wherein the polishing layer has a polishing surface adapted for polishing the substrate. Also provide are methods of making and using the chemical mechanical polishing pad.
priorityDate 2013-05-31^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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