http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105717743-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate | 2015-12-15^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2021-12-21^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-12-21^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-105717743-B |
titleOfInvention | Photosensitive resin composition and application thereof |
abstract | The invention provides a photosensitive resin composition and application thereof. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), and a thermal initiator (F). The photosensitive resin composition for a black matrix according to the present invention has an advantage of improving resolution and Taper angle (Taper angle). |
priorityDate | 2014-12-19^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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