http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106340451-B

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2605
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B3-0047
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-26
filingDate 2016-07-06^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-01-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-01-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106340451-B
titleOfInvention Heat treatment method and heat treatment apparatus
abstract The invention provides a heat treatment method and a heat treatment apparatus capable of omitting simulation operation. A lower surface of a semiconductor wafer (W) held by a holder (74) in a chamber (6) is irradiated with light from a Halogen Lamp (HL) and preheated, and then an upper surface of the semiconductor wafer (W) is irradiated with flash light from a Flash Lamp (FL) and flash heating is performed. Before starting a heat treatment of a first semiconductor wafer (W) in a batch, a high-temperature process gas heated by a heater (22) is supplied into a chamber (6), thereby preheating an in-chamber structure including a pedestal (74). The temperature of the structure in the chamber is raised to the same level as that in the normal process, so that all the semiconductor wafers (W) constituting one batch can be supported by the same temperature support (74) even if the simulation operation is not performed, and the temperature history can be made uniform.
priorityDate 2015-07-06^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951

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