http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107359123-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76886 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66484 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5256 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 2013-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-11-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-11-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107359123-B |
| titleOfInvention | Electric fuse structure and forming method thereof, semiconductor devices and forming method thereof |
| abstract | A variety of electric fuse structures and forming method thereof, semiconductor devices and forming method thereof are provided in the embodiment of the present invention, such as it is adulterated into nano wire or fin, form electric fuse structure, while forming all-around-gate transistor or fin formula field effect transistor, corresponding electric fuse structure is formed, the diversity to form electric fuse structure and semiconductor devices is realized.Also, when the step of forming electric fuse structure parasitized among the step of forming all-around-gate transistor or fin formula field effect transistor, additional processing step is not will increase, production cost is low. |
| priorityDate | 2013-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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