http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107523220-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_94d4659b3fc2f75189fc8b12ba28572b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F1-447 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2017-08-04^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77b843548950d35292dc9e81c569026e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1d8c26b7aefca85a56c912ee70ea849 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ef58c1a3bf9290d89a7cc20469b73a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40c29429c0ac9dd8e6bc808a817bd1b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83a0e8d3528a8eee695e3cd1353ced13 |
| publicationDate | 2017-12-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-107523220-A |
| titleOfInvention | Magnetorheologicai polishing liquid for GaAs polishing and preparation method thereof |
| abstract | The invention provides a kind of Magnetorheologicai polishing liquid for GaAs polishing and preparation method thereof.Including：Ferromagnetic particle, deionized water, surfactant, other additives and polishing powder, the percentage by weight of various components are as follows：Ferromagnetic particle 35% 75%, deionized water 10% 50%, surfactant 3% 7%, alpha fibers 1% 3%, other additives 1% 7% and polishing powder 2% 5%.Magnetorheologicai polishing liquid can be used for the ultra-thin substrate processing of GaAs, realize low stress, low damage, the Ultra-smooth machining of the ultra-thin substrate of GaAs.Oxidant is introduced in polishing fluid, increase surface corrosion effect, is easy to material to remove；Alpha fibers is added, network structure is formed in polishing fluid, strengthens the cutting performance of polishing fluid, and then increases the shear yield stress in polishing process, increases material removing rate, effectively lifts the stability and rheological property of Magnetorheologicai polishing liquid.The preparation process of the Magnetorheologicai polishing liquid of the present invention is only comprising dry, ultrasonic disperse and the step of high-speed stirred three, and preparation technology is simple, and cost is cheap. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114507478-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111266939-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114752306-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109536039-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109079588-A |
| priorityDate | 2017-08-04^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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