http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107852806-B

Outgoing Links

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2439
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
filingDate 2016-07-21^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-03-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-03-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107852806-B
titleOfInvention Electrode assembly and plasma source for generating athermal plasma and method of operating a plasma source
abstract The invention relates to an electrode arrangement (5) for generating athermal plasma, having a first electrode (7) and a second electrode (9) which are electrically insulated from each other and spaced apart from each other by a dielectric element (11). The thickness of the first electrode (7) is at least 10 μm as seen from the mutually spaced direction of the electrodes (7, 9), wherein the second electrode (9) is seen from the mutually spaced direction of the electrodes (7, 9). ) has a thickness of at least 1 μm to at most 5 μm, or a thickness of at least 5 μm to at most 30 μm. The dielectric element (11) has a thickness of at least 10 μm to at most 250 μm.
priorityDate 2015-07-23^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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