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filingDate 2019-04-11^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-04-26^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-04-26^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110028055-B
titleOfInvention Method for preparing semiconductor single-walled carbon nanotube based on methylation modification
abstract The invention discloses a method for preparing a semiconductor single-walled carbon nanotube based on methylation modification. The preparation method of the semiconductor single-walled carbon nanotube comprises the following steps: (1) single-walled carbon nanotubes were grown on ST-cut quartz using chemical vapor deposition. (2) Transferring single-walled carbon nanotubes grown in ST-cut quartz to SiO 2 a/Si substrate. (3) Mixing the above SiO 2 the/Si substrate is put into a solution containing di-tert-butyl peroxide and irradiated by an ultraviolet xenon lamp, and finally cleaned by ethanol and dried by nitrogen. The purity of the semiconductor single-walled carbon nanotube prepared by the method is higher than 90%. The innovation of the method is that the metallic single-walled carbon nanotube is not removed, so that the metallic single-walled carbon nanotube can show the semiconductor performance. The method is convenient and rapid, reduces the influence of various negative factors brought by the traditional separation method to a certain extent, and provides a new research direction for the control and preparation of the semiconductive single-walled carbon nanotube.
priorityDate 2019-04-11^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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