http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110529736-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-34 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17D1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17D3-01 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F17D3-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F17D1-04 |
| filingDate | 2019-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-09-14^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-09-14^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-110529736-B |
| titleOfInvention | A chemical vapor deposition system, gas supply device and gas supply method |
| abstract | The invention provides a chemical vapor deposition system, a gas supply device and a gas supply method. The gas supply device includes a terminal header, a first gas supply line and at least one backup gas supply line; the first gas supply line includes a mixed gas supply Branch line, process gas supply branch line, gas mixing container and sixth electromagnetic pneumatic valve, process gas supply branch line includes process gas storage container, high-purity filter, fourth electromagnetic pneumatic valve, fifth electromagnetic pneumatic valve, third pressure transmitter , a first mass flow meter, a first purge gas line and a second purge gas line; the backup gas supply line is the same as the first gas supply line. The gas supply device of the chemical vapor deposition system of the invention can realize on-line switching and stable, safe and continuous gas supply, so as to ensure the stability of the process gas supply during the chemical vapor deposition process. |
| priorityDate | 2019-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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