| abstract |
The invention discloses a preparation method of a W target material with high density and fine grains and easy to form, belonging to the technical field of magnetron sputtering target material manufacture. The W target material is preformed by cold pressing to obtain a preformed W target blank, and the relative density of the preformed W target blank is 60% to 70%; then the preformed W target blank is subjected to hot isostatic pressing Sintering and densifying to obtain a densified W target blank, the relative density of the densified W target blank is 93% to 96%; finally, it is sintered and densified by uncoated secondary hot isostatic pressing to obtain a W target. The density of the material is >99%, the average grain size is <20μm, and the yield is >95%. The W target has a low probability of forming and cracking, high yield, simple process and easy operation, and secondary hot isostatic pressing sintering and densification, which can reduce the sintering temperature in the hot isostatic pressing process and obtain tungsten targets with fine grains. material. |