http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111999980-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-14 |
| filingDate | 2020-05-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f47657288576cd97fe9241f67013cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ac065c818068652a814fdab2f43753b |
| publicationDate | 2020-11-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111999980-A |
| titleOfInvention | Chemically amplified positive photosensitive resin composition, protective film and module |
| abstract | The invention provides a chemically amplified positive photosensitive resin composition, a protective film and a component. The chemically amplified positive photosensitive resin composition comprises a resin (A), a photoacid generator (B), a solvent (C) and an epoxy compound (D). The invention also comprises a protective film prepared by applying the chemical amplification type positive photosensitive resin composition and a component comprising the protective film. The protective film has good development adhesion and chemical resistance, and can be used as a planarization film for a thin film transistor substrate, an interlayer insulating film, or a core material or a coating material of an optical waveguide. |
| priorityDate | 2019-05-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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