| abstract |
The invention discloses a method for preparing a nickel-chromium alloy for sputtering targets. The method comprises the following steps: 1. placing electrolytic nickel powder and chromium powder in a mixer in a mass ratio of 8:2 and mixing them uniformly, and then mixing The finished material is cold isostatically pressed to obtain a nickel-chromium alloy blank; 2. The nickel-chromium alloy blank is hot-pressed and sintered in a vacuum hot-pressing sintering furnace to obtain a nickel-chromium alloy slab; 3. The nickel-chromium alloy slab is cut After reaching the desired size, annealing is performed to obtain a nickel-chromium alloy for a sputtering target. The invention has the advantages of simple method, convenient operation, high product yield, high powder utilization rate, no pollution, and no waste, waste acid and other pollutants are generated in the preparation process. |