http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114197012-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ed37d831d5cc5ae9900859dace9818b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-246 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-24 |
| filingDate | 2021-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6248536fba789b9066f5e18ba313e9d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_235905a6e632bbd483933270406c8308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c18bb27147d670c85bbd4a0c55a01d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d7ce16c9ef5dea86f1ad5666b0505f3 |
| publicationDate | 2022-03-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-114197012-A |
| titleOfInvention | A kind of oxidation line double row oxidation process |
| abstract | The invention discloses a double-row oxidation process for oxidation lines, comprising the following steps: step 1, degreasing: at room temperature, the composition of the bath liquid is 2%-3% of an acidic degreasing agent for 1-3min degreasing, and step 2, alkaline etching : The composition of the bath liquid is NaOH, the temperature of the flat light alkaline etching bath is 40-45℃, the alkali etching time is 1-3min, the temperature of the sand surface alkali etching bath is 40-55℃, and the alkali etching time is 10-30min; step 3, in the middle and: HSO4 with a bath composition concentration value of 150-180g/l, neutralized for 3 minutes at room temperature, step 4 , anodizing: H2SO4 with a bath composition concentration value of 150‑180g/l, bath temperature is 18±2°C, the oxidation voltage is 17-19V, step 5, coloring: the bath composition is SnSO 4 with a concentration value of 13-15g/l, the bath temperature is 18°C, the oxidation voltage is 17-19V, and the coloring time is 960s-1000s, the invention has the advantages of obvious effect, optimized production process, improved product performance, strong practicability, and easy popularization and use. |
| priorityDate | 2021-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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