Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdda2fb03aa4557dc3ad32489c68a4bf |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0687 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 |
filingDate |
2022-03-21^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f63418f7b230fdf7be102d5feb0c71cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c593f709b984c08c1b7e47f51c34864 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18aa49bbe38064fa3eea0d7065b42693 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb0d99654f97bd238f538e45d2510c05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1ef65383f01882a6584ea9651b3644d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_432e702af3a11a2bb87971f26ad9e154 |
publicationDate |
2022-07-08^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-114725223-A |
titleOfInvention |
A kind of solar cell anti-reflection film and its preparation method and application |
abstract |
The invention relates to a solar cell antireflection film, a preparation method and application thereof, and belongs to the technical field of solar cells. The solar cell antireflection film of the present invention comprises an inorganic layer and a photoresist layer stacked in sequence; the refractive index of the inorganic layer is 2.3-2.4; the refractive index of the photoresist layer is 1.55-1.65; The thickness of the layer is 65 nm˜75 nm; the thickness of the photoresist layer is 90 nm˜110 nm. The invention realizes the control of the reflectivity of the anti-reflection film by controlling the thickness and refractive index of the inorganic layer and the photoresist layer, and finally obtains the anti-reflection film with low reflectivity. |
priorityDate |
2022-03-21^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |