| abstract |
The present application discloses a thin film transistor and a manufacturing method thereof, a display panel and a display device, belonging to the technical field of display. In this method, the protective electrode layer and the active layer are formed by one patterning process, and the protective electrode layer and the source and drain layers are formed by different patterning processes. In this way, on the premise of not increasing the difficulty of the process, the formed protective electrode layer can cover the source and drain layers, which reduces the probability of the source and drain layers being oxidized, improves the conductivity of the source and drain layers, and further improves the performance of the thin film transistor. performance. |