http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CS-232684-B1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13a6d6f64ea856e464a6bdd87c8899ba |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-32 |
filingDate | 1982-04-13^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f463ce635251bc81c7b81a1d3e332e9 |
publicationDate | 1985-02-14^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CS-232684-B1 |
titleOfInvention | Polishing pad |
abstract | Polishing pad for polishing especially opticalnespecially monocrystalline elementsnor glass for perfect polishing while reachingnsignificantly low technologicalntimes for the polishing operation, which consists of textilenwoven and nonwoven materials of naturalnor synthetic fibers, modifiednimpregnation with polyurethane-based resin,nwherein the resin impregnation is reactiven25-45% productnmol. 4,4‘-diphenylmethane diisocyanate;n60 mol% aliphatic or alicyclicnof a monofunctional alcohol C < t to C10 in usen12 to 18 mol. water as a boosternagents and blowing agents allowing choicenratios of reactants and processninfluence the penetration hardness ShDnwithin wide limits. |
priorityDate | 1982-04-13^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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