http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CS-232684-B1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13a6d6f64ea856e464a6bdd87c8899ba
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-32
filingDate 1982-04-13^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f463ce635251bc81c7b81a1d3e332e9
publicationDate 1985-02-14^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CS-232684-B1
titleOfInvention Polishing pad
abstract Polishing pad for polishing especially opticalnespecially monocrystalline elementsnor glass for perfect polishing while reachingnsignificantly low technologicalntimes for the polishing operation, which consists of textilenwoven and nonwoven materials of naturalnor synthetic fibers, modifiednimpregnation with polyurethane-based resin,nwherein the resin impregnation is reactiven25-45% productnmol. 4,4‘-diphenylmethane diisocyanate;n60 mol% aliphatic or alicyclicnof a monofunctional alcohol C < t to C10 in usen12 to 18 mol. water as a boosternagents and blowing agents allowing choicenratios of reactants and processninfluence the penetration hardness ShDnwithin wide limits.
priorityDate 1982-04-13^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538410
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID702
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7570

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