http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10060002-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ee12a05c7bf51327bc4b4f54e10bc88 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-452 |
| filingDate | 2000-12-02^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-01-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601f0f79fcc0cf434d8e7b0d7a427015 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99b73da968b622874c4c1ad04f5c6468 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85ea698e8697b5b583bb10989669ef20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89c32809aa78ab8e5a2b1f114214f1cc |
| publicationDate | 2016-01-28^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-10060002-B4 |
| titleOfInvention | Device for surface treatment |
| abstract | A surface treatment device (25, 27) for producing raw gas plasma by generating plasma in a housing (2), which housing (2) is provided with plasma generating devices, a raw gas inlet (8) and a substrate support table (9), wherein in case of performing a surface treatment plasma can be generated by the plasma generation devices and the surface of a substrate (S) arranged on the substrate support table (9) can be treated with the plasma, wherein a desired potential can be applied to the substrate support table (9), the housing (2) being arranged in two chambers namely, a plasma generating chamber (3) formed between a cathode (5, 5 ', 5'', 11, 11', 15, 16, 35) and an anode (14, 14 '), and an outside the substrate-processing chamber (4) arranged on the plasma-generating chamber (3) and provided with the substrate-carrying table (9), wherein the raw gas inlet (8) is open toward the plasma generating chamber (3), and wherein the cathode (5, 5 ', 5, 11, 11'', 15, 16, 35) has a plurality of bottomed recesses (5a , 35a) or in the surface opposite the anode (14, 14 ') has at least one through-hole (11b), the anode (14, 14 ') having one or more through holes (7, 14d, 17b, 17d) connected to both a space between the substrate treatment chamber (4) and the cathode (5, 5', 5 ', 11, 11 ', 15, 16, 35), as well as being communicatively connected to the substrate treatment chamber (4), wherein at least one of the recesses (5a, 35a) or the through hole (11b) of the cathode (5, 5, 5 '', 11, 11 ', 15, 16, 35) spaced areas, and in addition at least one of the through holes (7 , 14d, 17b, 17d) of the anode (14, 14), and at least one of the recesses (5a, 35a) of the cathode (5, 5 ', 5'', 11, 11, 15, 16, 35) or the through-hole (11b) the cathode (5, 5 ', 5 ", 11, 11", 15, 16, 35) and at least one of the through holes (7, 14d, 17b, 17d) of the anode (14, 14') as Hollow discharge generating regions are formed in the case of performing a surface treatment; ... |
| priorityDate | 1999-12-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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