| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e4fadad434969ae2ef7e2a4b5e4f48e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-483
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02521
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02524 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate |
2012-06-08^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-10-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96801c393793aec370200670a6547da8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74534c5c54dc20f3044f8a7ea432d516 |
| publicationDate |
2014-10-23^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-102012209650-B4 |
| titleOfInvention |
Plasma assisted chemical vapor deposition process with increased plasma density |
| abstract |
Method for coating surfaces of a substrate according to the method of plasma-assisted chemical vapor deposition, characterized in that the plasma density of a background plasma on the surface of the substrate (8) is increased by the formation of an additional ionization process characterized as a fireball (6) forms on a positively biased (4) electrode surface (2) of an electrode (2) when the electrode (2) is introduced into the background plasma and the positive voltage (4) applied to the electrode (2) exceeds the ionization potential of the plasma-forming process gas, and which changes the space charge near the electrode surface (2) in such a way that an almost two-dimensional, flat Debye layer on the electrode surface (2) expands to form a three-dimensional structure. |
| priorityDate |
2012-06-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |