| abstract |
A gas dispersion device for use with a process chamber, comprising: a quartz body having a top, a ring connected to a bottom surface of the top, and a base plate having a plurality of dispersion openings and being oppositely connected to the top of the ring; a plurality of quartz plates disposed between the top and the base plate, wherein the plurality of quartz plates are positioned one above the other and spaced to form a plenum space over each of the plurality of plates and the base plate; a plurality of quartz tubes for connecting the collection spaces to the plurality of dispersion openings, each of the plurality of quartz tubes having a first end disposed in one of the collection spaces and a second end connected to one of the dispersion openings; and a plurality of conduits arranged through the top, each of the plurality of conduits being connected to one of the plenums. |