http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-4029609-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc905cbef116a1ec61d12125af9427f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-346 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-34 |
| filingDate | 1990-09-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50c6ef9c7ccea91446af1c3a352ac12a |
| publicationDate | 1992-04-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-4029609-A1 |
| titleOfInvention | METHOD FOR APPLYING AN ANTI-STABLE PATTERN TO A SUBSTRATE |
| abstract | Formation of an etch-resistant pattern on a substrate comprises a) formation of a photoresist layer on a flat, transparent carrier substrate; b) formation of a photoresist pattern in the photoresist layer; c) lamination of the photoresist pattern carrier substrate onto a receiving substrate using a curable liq. adhesive between both substrates, where the photoresist side lies opposite the receiving substrate side, d) hardening of the liq. adhesive by heating or pref. by actinic photo-irradiation and removal of the carrier substrate for transfer of the photoresist pattern onto the receiving substrate, and e) dry-development of the pattern transferred from the carrier substrate by oxygen plasma- or oxygen reactive ion etching on the receiving substrate. USE/ADVANTAGE - Useful for formation of micropatterns and for prodn. of integrated switching circuits. Sufficient pattern reproduction is realised with simple good reproduction with minimisation of the influence of substrate topography. |
| priorityDate | 1990-09-19^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Showing number of triples: 1 to 26 of 26.