| abstract |
Aromatic polyamide film, having an excellent thermal resistance and a high dielectric breakdown strength, which comprises an aromatic polyamide containing repeating units of the formulan [H - Ar, - CO ] or [NH-Ar 1 -NHCO-Ar 1 -CO] and cross linked with a cross-linking compound having at least one radical selected from R 1 -C(R 2 ) = C-CH 2 (R 1 )-, R 1 -C(R 2 ) = CR'-, R 1 -C(R 2 ) = C(R 1 )- COO - and R 1 - C(R 2 ) = C(R 1 ) - CONH -, nor another cross-linking cyanuric or isocyanuric acid compound, by means of heat, ultraviolet rays or electron beam. |