http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0052198-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4ff9ddf728a7e1a0b36c9cc38b89ad6 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-092 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2257 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66272 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-331 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-225 |
| filingDate | 1981-09-18^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f6ce03f4a9a33fb6a36de39a04280d8 |
| publicationDate | 1982-05-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0052198-A2 |
| titleOfInvention | Method of manufacturing semiconductor devices using self-alignment techniques |
| abstract | A method of manufacturing a semiconductor device includes a step of forming a film (25a) doped with an emitter impurity on a predetermined surface area of a semiconductor layer (23). An ion implantation blocking layer (26) is formed to cover the top and side surfaces of the doped film (25a) and the exposed surface of the semiconductor layer (23). Then, the blocking layer (26) is anisotropically etched by irradiating it with a dry etchant in a direction substantially normal to the semiconductor layer (26). The anisotropic etching is carried out until the top surface of the doped film (25a) is substantially exposed, thereby allowing a portion (26a) of the blocking layer to leave surrounding the doped film and also substantially forming a base contact hole (27) defined by the exposed side surface (26b) of the remaining blocking layer (26b). Subsequently, ion implantation is conducted against the semiconductor layer (23) with the remaining blocking layer (26a) used as a mask, to form at least a base contact region of a high impurity concentration in a portion of the semiconductor layer (23) corresponding to the base contact hole (26). |
| priorityDate | 1980-09-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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