http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0100938-A2

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00
filingDate 1983-07-20^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58d6399842b032f6701401ec6213a4f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e58df54b942be39228c4a2fdd135a08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00faa2b18ad144ed4ac901135724efcb
publicationDate 1984-02-22^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0100938-A2
titleOfInvention Treatment of image-forming laminated plate
abstract An image-forming laminated plate, particularly a dry planographic printing unprocessed plate, comprising a base substrate, a photosensitive layer containing a substance with quinonediazide structure and a silicone rubber layer in laminating order is treated with a base after imagewise exposure. In addition, the image-forming laminated plate may be subjected to a whole surface slight exposure to the extent that 5 to 60 molar % of the quinonediazide structure in the photosensitive layer to be exposed is photo-decomposed into carboxylic acid structure before or after the usual imagewise exposure for obtaining a negative working plate, or the image-forming laminated plate may be subjected to a imagewise slight exposure to the same extent without the usual imagewise exposure for obtaining a positive working plate. The base-treatment alone or in combination with the slight exposure enhances both the adhesion of the photosensitive layer to the silicone rubber layer and the solvent resistance of the photosensitive layer in non-image areas.
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