http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0148830-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac93f643b44e958763fd1234fe359e3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f5ac4493e7295eac08235a6c901f1bc8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ef9bd1ef0e5ef5a700a378eb78f7caea |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-593 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-593 |
filingDate | 1983-07-19^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_feeeb8a4e75e9a84a761c45a6bec5de9 |
publicationDate | 1985-07-24^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-0148830-A1 |
titleOfInvention | METHOD OF MANUFACTURING AN OBJECT COMPRISING ANISOTROPIC SILICON NITRIDE USING HIGHER DENSITY BLANKS AND HAVING FULLY REACTED. |
abstract | Method for densifying an agglomerate comprising silicon nitride and from 5 to 17% by weight of silicon oxynitride yttrium and having a density of 2.0 to 2.6 gm / cm3. The process consists in a) partially sintering the agglomerate at a temperature between 3000 and 3200oF for a period of time ranging from 0.5 to 72 hours to form a semi-dense body with a density of 2.9 to 3.15 gm / cm3, and b) hot compressing a stacked assembly of these bodies in the hot zone of a hot compression cavity to form fully dense anisotropic products. Each body is separated from the next by a spacing of not more than 0.03 inches, and the stacked assembly occupies substantially the entire length of the hot zone of the hot compression cavity. |
priorityDate | 1983-07-19^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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