http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0235640-A2
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f992ca1d23a07be5d3c27a5a0bd1aee2 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2223-076 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-223 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-223 |
filingDate | 1987-02-13^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fb8ed3c3123b31bacc715ebbc48d108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_745936cbdb0bbef964c769f9e3a8e593 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_855945e33c16d9a7a35bb7b0f6ed7df1 |
publicationDate | 1987-09-09^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-0235640-A2 |
titleOfInvention | Arrangement for non destructive measuring of metal traces |
abstract | The invention relates to an arrangement for the non-destructive measurement of metal traces in the surface of material samples, in which the surface is exposed to X-rays and the radiation emanating from the material sample is examined spectrometrically with a detector attached to the material sample.n n n The present invention has for its object to determine metallic contaminations in the surface of, for example, Si wafers down to about 10 11 atoms / cm 2 in the production line, the wafers must not be contaminated by the measuring process and wafers with a diameter up to about 150 mm at the positions defined by the relevant standards should be scanned over their entire surface.n n n The solution is characterized in that the X-ray radiation can be directed onto the surface of the material sample by means of an adjustable X-ray source, that the divergence of the exciting X-ray radiation can be limited by means of two diaphragms, that the diaphragms are arranged on a quartz body serving as an optical bench, and that a positioning device is provided with which the material sample can be pressed onto a surface of the quartz body. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9204623-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0464671-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0464671-A3 |
priorityDate | 1986-03-01^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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