http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0291994-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03627f82d4edc6567f9627df6efdde5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5c24684033fba97d1ad845ce453a57e3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 1988-05-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd8f82d77c9d4b311cc332b816797236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc48b65370a5efe01840db343c3023c9 |
| publicationDate | 1988-11-23^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0291994-A2 |
| titleOfInvention | Photoresist composition and photoresist material prepared therefrom, containing blocked monomer imide groups, and a suitable maleic-acid monomer |
| abstract | The invention relates to a photoresist mixture and thus produced photoresist material containing a polymer with imide groups which are blocked by methylol or substituted methylol groups bonded to acetal or ketal units, for example the formulas wherein R₀ is hydrogen or methyl R₀ ′ aryl, alkoxy or aryloxy, R₁ and R₂ are hydrogen or (C₁ - C₄) alkyl, R₃ With R₄, R₅ are hydrogen or (C₁ - C₄) alkyl R₆ (C₁ - C₁₀) alkyl R₇ is hydrogen or (C₁ - C₄) alkyl mean, an acid-releasing compound upon exposure which releases the acetal or ketal units by acid formed photolytically at a desired wavelength; and a solvent which dissolves the polymer and acid-releasing compound.n n n The invention also relates to the monomer containing imide groups, such as a maleimide derivative, by means of which the polymer can be prepared as a homo- or copolymer. The polymer can be split off in two stages, 1. when irradiated in the presence of the acid-forming compound and 2. during development, so that finally an alkali-soluble polymer is formed which can be obtained in can remove the irradiated areas.n n n The photoresist material is particularly suitable for DUV radiation and has a high resolving power. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5035979-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5034305-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6582970-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0453610-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5759750-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0361906-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0361906-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0553737-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5262283-A |
| priorityDate | 1987-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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