http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0359221-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1989-09-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_793ea4c8bbc799cce9be0e207e814e6a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_487502233f630a0bb208849b91fa774c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d44a7bdc917404aeb11be1b920a166a |
| publicationDate | 1990-03-21^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0359221-A2 |
| titleOfInvention | High pressure photoresist silylating process and apparatus |
| abstract | Disclosed herein are a method and apparatus for silylation of positive or negative photosensitive resist layer on a semiconductor wafer after the resist layer has been exposed to radiant energy through a mask which includes introducing a silylating agent to the wafer at high pressure over 760 torr and, usually, at temperatures less than 180° C. Increased pressure increases the rate of silylation, allows practical use of lower process temperatures, and, therefore, allows better process control. The apparatus for applying the high pressure silylation process includes a process chamber having a port and a process gas inlet; a heated substrate in the process chamber; a loadlock in fluid communication with the process chamber through the port; and a gas generator in fluid communication with the process chamber through the gas inlet. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1228528-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1228528-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-4040117-A1 |
| priorityDate | 1988-09-16^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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