| abstract |
A non-glare pellicle comprising a thin optical film which is tautly adhered to one edge of a closed support frame, the film comprising a core layer having an index of refraction of 1.32 to 1.80 and a thickness of 0.3 to 20 microns, and at least one antireflective layer comprising a class of PDD copolymers which is defined herein. Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits. |