http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0501919-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e9445e5e3626f36e932c6451a928250 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-521 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-49 |
| filingDate | 1992-02-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34548b2254fe43a3409357c6bc7b161c |
| publicationDate | 1992-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0501919-A1 |
| titleOfInvention | Radiation-sensitive compositions based on polyphenols and acetals |
| abstract | a) mindestens ein festes filmbildendes Polyphenol, b) mindestens eine Verbindung der Formel In worin n n 2, 3 oder 4 darstellt, n Ar ein n-wertiger Benzol- oder Naphthalinrest oder ein zweiwertiger Rest der Formel IIn Q die direkte Bindung, -O-, -SO-, -SO₂-, -CH₂-, -C(CH₃)(Phenyl)- oder -C(CH₃)₂- ist, R₁ und R₂ unabhängig voneinander C₁-C₈-Alkyl oder unsubstituiertes oder durch C₁-C₄-Alkyl substituiertes Phenyl oder Naphthyl bedeuten oder R₁ und R₂ zusammen 1,2-Phenylen oder -[C(R′)(R˝)] m - darstellen, nR′ und R˝ unabhängig voneinander Wasserstoff, C₁-C₄-Alkyl oder Phenyl sind und m 2, 3 oder 4 ist, und. c) mindestens eine unter aktinischer Strahlung säurebildende Verbindung beschrieben. It contains radiation-sensitive compositions a) at least one solid film-forming polyphenol, b) at least one compound of the formula I. wherein n represents 2, 3 or 4, Ar is an n-valent benzene or naphthalene residue or a divalent residue of the formula II Q is the direct bond, -O-, -SO-, -SO₂-, -CH₂-, -C (CH₃) (phenyl) - or -C (CH₃) ₂-, R₁ and R₂ are independently C₁-C₁-alkyl or represent phenyl or naphthyl which is unsubstituted or substituted by C₁-C₄alkyl or R₁ and R₂ together represent 1,2-phenylene or - [C (R ′) (R˝)] m -, R 'and R˝ are independently hydrogen, C₁-C₄ alkyl or phenyl and m is 2, 3 or 4, and. c) describes at least one acid-forming compound under actinic radiation. n n n These compositions are used as a negative resist, in particular for the production of printing plates, printed circuits and integrated circuits. |
| priorityDate | 1991-03-01^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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