http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0903781-A3

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
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filingDate 1998-09-18^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cdb0a88a781c044a0afebd6dcb38ffc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbf7bda1618575c7e4c9e21aa3e72123
publicationDate 1999-07-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0903781-A3
titleOfInvention Method of forming embedded copper interconnections and embedded copper interconnection structure
abstract An embedded interconnections of copper is formed bynforming an insulating layer, forming an embeddedninterconnections of copper in the insulating layer, planarizingnan exposed surface of the insulating layer including an exposednsurface of the embedded interconnections of copper according tonchemical mechanical polishing, and forming a protective film ofnsilver on the exposed surface of the embedded interconnectionsnof copper. These steps are repeated on the existing insulatingnlayer thereby to produce multiple layers of embeddedninterconnections of copper. The exposed surface of the embeddedninterconnections of copper is plated with silver according tonimmersion plating.
priorityDate 1997-09-18^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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