| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4d9d138d23c7ca8bfae3daf28b4eba0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31551 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09B29-0011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-5281 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09B29-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-52 |
| filingDate |
1997-11-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2801188136779c3406f19fbe143e940
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_476bee3ea95da17c4417c4d3135b7eed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_892eb3f22922fef1724e7cf3a37a4d12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc7fe828b67f6e7b0e5ffe4afd64d2c8 |
| publicationDate |
2001-11-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0941865-A4 |
| titleOfInvention |
PROCESS FILM, PRIMARY INK AND CLICHING METHOD AND SYSTEM IN WHICH SAID FILM IS USED |
| abstract |
A process film which comprises a transparent substrate and, formed thereon, a layer consisting mainly of a polymer comprising repeating units represented by the following general formula (1): -[-AXAR1-]- wherein A represents formula (I) where x, y, and z are each an integer of 1 or larger and Y represents a hydrocarbon group having one or more carbon atoms; X represents a residue of an organic compound having two active hydrogen atoms; and R1 represents a residue of a dicarboxylic acid or diisocyanate compound. An image is formed on this film preferably by ink-jet recording using a process ink which contains a yellow dye absorbing an ultraviolet in a wavelength range of 350 to 450 nm, preferably a mono- or disazo dye. Thus, a high-quality photomask for platemaking having high resolution is obtained at a low cost. |
| priorityDate |
1996-11-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |