http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0981168-A2

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filingDate 1999-07-29^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e00d0d7d56830983b822fb20333d52ba
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publicationDate 2000-02-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0981168-A2
titleOfInvention Semiconductor micro-optical components and method for producing them
abstract A method for fabricating a monolithic micro-optical component. Thenconstruction of the micro-optical components is accomplished by usingnstandard semiconductor fabrication techniques. The method comprisesnthe steps of depositing an etch stop layer (44) onto a semiconductornsubstrate (42); depositing an optical component layer (46) onto the etchnstop layer (44); coating the entire surface of the optical component layernwith a photoresist material; applying a photoresist mask (50) to thenphotoresist material on the optical component layer (46); selectively etchingnaway the optical component layer (46) to form at least one optical columnn(52); forming a pedestal (54) for each of the optical columns (52) bynselectively etching away the etch stop layer (44); and finally polishing eachnof the optical columns (52), thereby forming monolithic optical componentsn(56). The method may optionally include the step of removing thenphotoresist mask from each of the optical columns prior to polishing thenoptical columns, as well as the step of depositing an antireflectivity coatingnonto each of the optical components.
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priorityDate 1998-08-18^^<http://www.w3.org/2001/XMLSchema#date>
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