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filingDate 2001-04-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b04ef119a943a850876a74d90c9bde36
publicationDate 2001-10-17^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1146014-A2
titleOfInvention Mesoporous silica films with mobile ion gettering and accelerated processing
abstract The present invention generally provides a process and an apparatus for depositingnlow dielectric constant films on a substrate. The low dielectric constant films are phosphorusndoped mesoporous oxide films formed by depositing and curing a phosphorus containing sol-gelnprecursor to form an oxide film having interconnecting pores of uniform diameter, andnthen annealing the film in an inert gas atmosphere or exposing the film to an oxidizingnatmosphere containing a reactive oxygen species to form a phosphorus doped mesoporousnoxide film.
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type http://data.epo.org/linked-data/def/patent/Publication

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