http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1152797-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_019defc89c5a98a4b6eba00f28e01df7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N5-1048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K5-10 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01T1-29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-10 |
| filingDate | 2000-02-02^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-10-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e618273d4f59684432b3de5d0b25108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a637b1a9ead168f21e65345a5906e0de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d586a53de3c1a67028fd15128a01d0a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8adef4e898c7b2e40367c581ffe81896 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cb31cb579ae8ca0e4ec430082e68b03 |
| publicationDate | 2004-10-06^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1152797-B1 |
| titleOfInvention | Method of operating an ion beam therapy system with monitoring of beam position |
| abstract | A method for the operation of an ion beam therapy system that comprises a grid scanner device, arranged in a beam guidance system (6, 8), having vertical deflection means (13) and horizontal deflection means (14) for the vertical and horizontal deflection of a treatment beam (11) perpendicular to its beam direction, with the result that the treatment beam (11) is deflected by the grid scanner device to an isocentre (10) of the irradiation site and scans a specific area surrounding the isocentre (10). For monitoring the operational stability and operational safety of the therapy system, the beam position of the treatment beam (11) in the region of the isocentre (10) is monitored and evaluated, intervention in the ion beam therapy system being carried out if the evaluation of the beam position shows a departure, from a predetermined desired value, that exceeds a specific tolerance value based on a required half-value width of the beam profile. That tolerance value is especially ±25 % of the required half-value width. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8114131-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8617211-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8262698-B2 |
| priorityDate | 1999-02-19^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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