| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc05229904be2987713acc8b41db7cd3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2000-11-08^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b952ec2db4663420182ce9cd010cf6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b615314e4283445004f1cd3a3ceb356
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f2259540353fa63d4383ba88e5e72c8 |
| publicationDate |
2001-11-14^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1154324-A1 |
| titleOfInvention |
Composition for antireflection coating |
| abstract |
A resist pattern having a good form without any T-top or roundntop is obtained by coating on a photoresist layer an anti-reflectivencoating composition containing at least (a) polyacrylic acid, (b)npolyvinyl pyrrolidone, (c) C n F 2n+1 COOOH (wherein n represents anninteger of 3 to 11) and (d) tetramethylammonium hydroxide to formnan anti-reflective coating, and conducting patternwise exposurenand development. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6845823-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1314374-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03043526-A1 |
| priorityDate |
1999-11-10^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |