| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2002-01-17^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72ffdbb5f1e0a23fc5de4c0439efa73f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7667383be1d5485400f876d4738a703 |
| publicationDate |
2002-07-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1225479-A2 |
| titleOfInvention |
Chemical amplifying type positive resist composition |
| abstract |
A chemical amplifying type positive resist compositionnhaving excellent sensitivity and resolution, manifesting nongeneration of scum is provided, which comprises a resin whichnhas a polymerization unit derived from hydroxystyrene and anpolymerization unit derived from 2-ethyl-2-adamantyln(meth)acrylate, and is insoluble or poorly soluble itself innan alkali, but becomes alkali-soluble after dissociation ofnthe above-mentioned acid unstable group by the action of annacid; a radiation sensitive acid generating agent; andnpolypropylene glycol. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BE-1015614-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6893794-B2 |
| priorityDate |
2001-01-19^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |