| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-34 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-34 |
| filingDate |
2000-10-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b22a1f3661e9ce5664cdd4e6ffc90547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5b0f77e114d86818d52a1446cb3b538
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17f0e85316718e600149e8c5b2f6e4a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_642e6c1d9368f1e4a8c9a6ea48254426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00b6f3df3ae8a188c7eb9dda936d26f0 |
| publicationDate |
2002-08-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1229389-A1 |
| titleOfInvention |
Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon |
| abstract |
Disclosed are a photosensitive resin compositionncomprising a photosensitive resin (A), a photopolymerizationninitiator (B), and a flame retardant (C), in which a contentnof halogen atoms or antimony atoms in the flame retardant isn5% or less by weight; a photosensitive element using this; anmethod of manufacturing a resist pattern; a resist pattern;nand a resist pattern laminated substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011095441-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9366957-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007105781-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101512437-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7935752-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11492509-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019121098-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7195857-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03041465-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3498788-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03005126-A1 |
| priorityDate |
1999-10-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |