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publicationNumber EP-1505439-A2
titleOfInvention Positive photosensitive composition and method of forming resist pattern
abstract A positive photosensitive composition comprises: (A)n5 to 20 parts by weight of the total amount of at least onencompound that generates an acid upon irradiation with an actinicnray; and (B) 100 parts by weight of the total amount of atnleast one fluorine atom-containing resin having a group thatnincreases a solubility of the resin in an alkaline developernby the action of an acid.
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