| abstract |
An improved method for nanoimprint lithography and more specifically fornproviding a nano-scale pattern on a substrate is disclosed. According to thenimprovement, a mould (100) and a substrate (115) are provided wherein thensubstrate (115) is provided with a plurality of coating layers (120, 125, 130) beforenpressing the mould (100) and substrate (115) together for transferring a pattern fromnthe mould (100) to the substrate (115). According to the invention, the substrate isnprovided with an uppermost layer (130) having a pure anti-adhesive function. |