| abstract |
A pellicle which is excellent in transmittance andndurability against short wavelength light, and which cannbe used for photolithography by using e.g. a KrF excimernlaser, is provided. n A pellicle for exposure to a light having anwavelength of at most 200 nm, which comprises a frame andna pellicle membrane bonded to the frame by means of annadhesive, wherein the pellicle membrane and/or thenadhesive comprises a polymer containing repeating unitsnrepresented by the following formula (1):n nwherein Q represents a C 1-3 polyfluoroalkylene groupnhaving a linear structure, or a group having at least onenatom selected from hydrogen atoms and fluorine atoms innsuch a polyfluoroalkylene group substituted by ansubstituent comprising a polyfluoroalkyl group which mayncontain an ethereal oxygen atom, or the like, and Xnrepresents a hydrogen atom, a fluorine atom or a C 1-3 npolyfluoroalkyl group which may contain an etherealnoxygen atom. |