http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2249206-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc6220b93fae4be14ada49e4ecc1860b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2009-03-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dabfbbf0a5be6d0ad4c1eccf61957ec9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a73053524958bd9ce80ac51e1cd91c4b |
| publicationDate | 2010-11-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2249206-A1 |
| titleOfInvention | Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition |
| abstract | An object of the present invention is to provide a semiconductor surface treating agent composition, which can realize easy removing of an anti-reflection coating layer in a production process of a semiconductor device or the like at a low temperature in a short time, a method for treating a semiconductor surface using the same, and further a semiconductor surface treating agent composition, which can realize not only removing of both layer of an anti-reflection coating layer and a resist layer, but can realize even removing of a cured resist layer produced in an etching process, and a method for treating a semiconductor surface using the same. The semiconductor surface treating agent composition of the present invention is characterized by comprising a compound which generates a fluorine ion in water, a carbon radical generating agent, and water and optionally an organic solvent, and the method for treating a semiconductor surface of the present invention is characterized by using the composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2474862-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2475000-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2475000-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2474862-A1 |
| priorityDate | 2008-03-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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