Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4e333bf44ab400ff0e1c654b0d7c3264 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-8305 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
filingDate |
2006-04-25^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e6abcce3174cdf9ab5d50a6136d531 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b586d06744acc49a16e8f9e67d24e33d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3208f350d132ace2752d427a8fee5a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_722866d4df733b3f9c40aff2e2cd8591 |
publicationDate |
2011-03-23^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-2298957-A2 |
titleOfInvention |
Method and apparatus of using solution based precursors for atomic layer deposition |
abstract |
The invention relates to a method of delivering a vaporized solution precursor to an atomic layer deposition chamber, comprising connection a vaporizer to the chamber and delivering a vaporized solution precursor from the vaporizer to the chamber, when the vaporizer is operated at a constant pressure. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020180235-A1 |
priorityDate |
2005-04-29^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |