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filingDate 2006-04-25^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e6abcce3174cdf9ab5d50a6136d531
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publicationDate 2011-03-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2298957-A2
titleOfInvention Method and apparatus of using solution based precursors for atomic layer deposition
abstract The invention relates to a method of delivering a vaporized solution precursor to an atomic layer deposition chamber, comprising connection a vaporizer to the chamber and delivering a vaporized solution precursor from the vaporizer to the chamber, when the vaporizer is operated at a constant pressure.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020180235-A1
priorityDate 2005-04-29^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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