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publicationDate 2011-04-20^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2312662-A1
titleOfInvention A method for patterning
abstract A method for solution deposition of at least one pattern of material on a substrate comprising the steps of: depositing one or more polymer layers onto a surface of the substrate; embossing the one or more polymer layers so as to define at least one depressed region and at least one raised region; etching the one or more polymer layers so as to reveal the surface of the substrate in the areas defined by the one or more depressed regions of the embossing step, and leaving a mask layer of polymer layer material in the areas defined by the one or more raised regions; and depositing a layer of material on to the substrate surface from solution, such that the deposition is confined by the area defined by the mask.
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